Document Type

Article

Abstract

High Al-content AlxGa1-xN (0.7 < x < 1) quasi-vertical Schottky barrier diodes (SBDs) with distributed polarization doping were grown on the bulk AlN substrate. They exhibit excellent rectification behavior with a large forward current density (~14 kA/cm2 ) and a high breakdown field of ~8.3 MV/cm. The SBDs also exhibited low ideality factors of (n~1.2) with a high Schottky barrier height (Φ b~ 1.7 eV). Thus, this study demonstrates the feasibility of the distributed polarization doping approach for high current–high voltage devices.

Digital Object Identifier (DOI)

https://doi.org/10.1063/5.0325830

Rights

ڣ2026 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/)

APA Citation

Jamil, T., Al, A., Mazumder, M., Rahman, M., Muhammad, Grigory, A., & Khan, A. (2026). AIxGa1−xN (0.7 < x < 1) Schottky Diodes Using Distributed Polarization Doped Layer with a Current Density of 14 kA/cm2. Applied Physics Letters, 128, 133501.https://doi.org/10.1063/5.0325830

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