Document Type
Article
Abstract
High Al-content AlxGa1-xN (0.7 < x < 1) quasi-vertical Schottky barrier diodes (SBDs) with distributed polarization doping were grown on the bulk AlN substrate. They exhibit excellent rectification behavior with a large forward current density (~14 kA/cm2 ) and a high breakdown field of ~8.3 MV/cm. The SBDs also exhibited low ideality factors of (n~1.2) with a high Schottky barrier height (Φ b~ 1.7 eV). Thus, this study demonstrates the feasibility of the distributed polarization doping approach for high current–high voltage devices.
Digital Object Identifier (DOI)
Publication Info
Published in Applied Physics Letters, Volume 128, 2026, pages 133501-.
Rights
ڣ2026 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
APA Citation
Jamil, T., Al, A., Mazumder, M., Rahman, M., Muhammad, Grigory, A., & Khan, A. (2026). AIxGa1−xN (0.7 < x < 1) Schottky Diodes Using Distributed Polarization Doped Layer with a Current Density of 14 kA/cm2. Applied Physics Letters, 128, 133501.https://doi.org/10.1063/5.0325830