Development of an Optimization Procedure for Magnetron Sputtered Thin Films to Facilitate Combinatorial Materials Research

Author(s)

Jonathan K. Bunn
Richard Z. Voepel
Zhiyong Wang
Edward P. Gatzke
Jochen A. Lauterbach, University of South Carolina - ColumbiaFollow
Jason R. Hattrick-Simpers

Document Type

Article

Subject Area(s)

Engineering, Chemical Engineering, Catalysis and Reaction Engineering, Physical Sciences and Mathematics, Physics

Digital Object Identifier (DOI)

https://doi.org/10.1021/acs.iecr.5b04196

Publication Info

Postprint version. Published in Industrial & Engineering Chemistry Research, Volume 55, Issue 5, 2016, pages 1236-1242.

© Industrial & Engineering Chemistry Research, 2016, American Chemical Society

Bunn, K.J., Voepel, Z.R., Wang, Z., Gatzke, P.E., Lauterbach, A.J., Hattrick-Simpers, R.J. (2016). Development of an Optimization Procedure for Magnetron Sputtered Thin Films to Facilitate Combinatorial Materials Research. Industrial & Engineering Chemistry Research, 55(5), 1236-1242.

http://dx.doi.org/10.1021/acs.iecr.5b04196

APA Citation

Bunn, J., Voepel, R., Wang, Z., Gatzke, E., Lauterbach, J., & Hattrick-Simpers, J. (2016). Development of an Optimization Procedure for Magnetron-Sputtered Thin Films to Facilitate Combinatorial Materials Research. Industrial & Engineering Chemistry Research, 55(5), 1236-1242. doi:10.1021/acs.iecr.5b04196

Rights

© Industrial & Engineering Chemistry Research, 2016, American Chemical Society

Bunn, K.J., Voepel, Z.R., Wang, Z., Gatzke, P.E., Lauterbach, A.J., Hattrick-Simpers, R.J. (2016). Development of an Optimization Procedure for Magnetron Sputtered Thin Films to Facilitate Combinatorial Materials Research. Industrial & Engineering Chemistry Research, 55(5), 1236-1242.

http://dx.doi.org/10.1021/acs.iecr.5b04196