https://doi.org/10.1021/acs.iecr.5b04196 ">
 

Development of an Optimization Procedure for Magnetron Sputtered Thin Films to Facilitate Combinatorial Materials Research

Document Type

Article

Subject Area(s)

Engineering, Chemical Engineering, Catalysis and Reaction Engineering, Physical Sciences and Mathematics, Physics

Digital Object Identifier (DOI)

https://doi.org/10.1021/acs.iecr.5b04196

Rights

© Industrial & Engineering Chemistry Research, 2016, American Chemical Society

Bunn, K.J., Voepel, Z.R., Wang, Z., Gatzke, P.E., Lauterbach, A.J., Hattrick-Simpers, R.J. (2016). Development of an Optimization Procedure for Magnetron Sputtered Thin Films to Facilitate Combinatorial Materials Research. Industrial & Engineering Chemistry Research, 55(5), 1236-1242.

http://dx.doi.org/10.1021/acs.iecr.5b04196

APA Citation

Bunn, J., Voepel, R., Wang, Z., Gatzke, E., Lauterbach, J., & Hattrick-Simpers, J. (2016). Development of an Optimization Procedure for Magnetron-Sputtered Thin Films to Facilitate Combinatorial Materials Research. Industrial & Engineering Chemistry Research, 55(5), 1236-1242. doi:10.1021/acs.iecr.5b04196

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