A technique based on the analytical method of lines is presented for predicting shape changes during electrodeposition. The technique is presented for both primary and secondary current distributions. The method presented does not require iterations for nonlinear Butler-Volmer boundary conditions or changing electrode shapes. The technique is based on a semianalytical method developed earlier for predicting current distributions in electrochemical cells. This technique is attractive because it provides a symbolic solution for the Laplace equation, and hence requires less computation time to perform case studies.
Published in Journal of the Electrochemical Society, Volume 149, Issue 10, 2002, pages C498-C505.
© The Electrochemical Society, Inc. 2002. All rights reserved. Except as provided under U.S. copyright law, this work may not be reproduced, resold, distributed, or modified without the express permission of The Electrochemical Society (ECS). The archival version of this work was published in
Subramanian, V.R., & White, R.E. (2000). Simulating Shape Changes during Electrodeposition: Primary and Secondary Current Distribution. Journal of the Electrochemical Society, 149(10): C498-C505.
Publisher’s Version: http://dx.doi.org/10.1149/1.1505637