Document Type

Article

Subject Area(s)

Chemical Engineering

Abstract

A general multiple electrode reaction model for electrodeposition of alloys on a rotating disk electrode is presented. Included in the model are mass transport equations with the effect of ionic migration, Butler-Volmer kinetic rate expressions, and the mole fractions of the individual components in the solid state. The model shows that the effect of ionic migration is important and that plating variables such as applied potential, pH, and bulk concentration can be included. Two examples (Ni-P and Ru-Ni-P) are used to illustrate the predictions of the model.

Rights

© The Electrochemical Society, Inc. 1988. All rights reserved. Except as provided under U.S. copyright law, this work may not be reproduced, resold, distributed, or modified without the express permission of The Electrochemical Society (ECS). The archival version of this work was published in the Journal of the Electrochemical Society.

http://www.electrochem.org

DOI: 10.1149/1.2096238

http://dx.doi.org/10.1149/1.2096238

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