Prevention of Photoresist Pattern Collapse by Using Liquid Carbon Dioxide

Author(s)

Ye Jinaco
Michael A. Matthews, University of South Carolina - ColumbiaFollow
Charles H. Darvin

Document Type

Article

Publication Info

Industrial and Engineering Chemistry Research, Volume 40, Issue 24, 2001, pages 5858-5860.

©Industrial and Engineering Chemistry Research 2001, American Chemical Society.

Jinaco, Y., Matthews, M. A., & Darvin, C. H. (2001). Prevention of Photoresist Pattern Collapse by Using Liquid Carbon Dioxide. Industrial and Engineering Chemistry Research, 40 (24), 5858-5860. http://dx.doi.org/10.1021/ie010424h

Rights

©Industrial and Engineering Chemistry Research 2001, American Chemical Society.

Jinaco, Y., Matthews, M. A., & Darvin, C. H. (2001). Prevention of Photoresist Pattern Collapse by Using Liquid Carbon Dioxide. Industrial and Engineering Chemistry Research, 40 (24), 5858-5860. http://dx.doi.org/10.1021/ie010424h