Document Type

Article

Subject Area(s)

Chemical Engineering

Abstract

A mathematical model for the electroless deposition of copper on a planar electrode is presented and used to make time-dependent predictions on the various quantities in the system. The model takes into account mass transport by diffusion and migration, Butler-Volmer kinetics at the electrode surface, and mixed potential theory. A finite difference approach is used to solve the equations, and the resultant model is used to predict the concentration profiles, potential response, and plating rate as a function of time and concentration of various reactive components.

Rights

© The Electrochemical Society, Inc. 1999. All rights reserved. Except as provided under U.S. copyright law, this work may not be reproduced, resold, distributed, or modified without the express permission of The Electrochemical Society (ECS). The archival version of this work was published in the Journal of the Electrochemical Society.

http://www.electrochem.org/

Publisher's link: http://dx.doi.org/10.1149/1.1391572

DOI: 10.1149/1.1391572

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