Interfacial Modification of Amorphous Substrates for Microcrystalline Silicon Growth with in situ Hydrogen Plasma Pretreatment

Author(s)

Young-Bae Park
Shi-Woo Rhee
Xiaodong Li, University of South Carolina - ColumbiaFollow

Document Type

Article

Publication Info

Published in Physica Status Solidi (a), Volume 202, Issue 13, 2005, pages 2448-2453.

©Physica Status Solidi (a) 2005, Wiley-VCH Verlag.

Oark Y-B., Rhee, S-W., & Li, X. (October 2005). Interfacial Modification of Amorphous Substrates for Microcrystalline Silicon Growth with In Situ Hydrogen Plasma Pretreatment. Physica Status Solidi (a), 202 (13), 2448 – 2453. http://dx.doi.org/10.1002/pssa.200521144

Rights

©Physica Status Solidi (a) 2005, Wiley-VCH Verlag.

Oark Y-B., Rhee, S-W., & Li, X. (October 2005). Interfacial Modification of Amorphous Substrates for Microcrystalline Silicon Growth with In Situ Hydrogen Plasma Pretreatment. Physica Status Solidi (a), 202 (13), 2448 – 2453. http://dx.doi.org/10.1002/pssa.200521144