Document Type



Deposition of aluminumfilm from DMEAA in the temperature range of 100–300 °C has been studied. In this temperature range, there is a maximum deposition rate at around 150 °C. The film deposited at 190 °C has elongated blocklike grain shapes, which are ∼600 nm in width and 930 nm in length. Grains in the film deposited at 150 °C showed an equiaxed structure with grain size in the range of 100–300 nm in a film with 600 nm thickness. Aluminum oxide particle inclusion was observed especially at high deposition temperature. Plausible reaction pathways of DMEAA dissociation were suggested to explain the experimental observations.


©Applied Physics Letters 1996, American Institute of Physics.

Kim, B-Y., Li, X., & Rhee, S-W. (17 June 1996). Microstructure and Deposition Rate of Aluminum Thin Films from Chemical Vapor Deposition with Dimethylethylamine alane. Applied Physics Letters, 68 (25), #3567.