Interfacial Modification of Amorphous Substrates for Microcrystalline Silicon Growth with in situ Hydrogen Plasma Pretreatment

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©Physica Status Solidi (a) 2005, Wiley-VCH Verlag.

Oark Y-B., Rhee, S-W., & Li, X. (October 2005). Interfacial Modification of Amorphous Substrates for Microcrystalline Silicon Growth with In Situ Hydrogen Plasma Pretreatment. Physica Status Solidi (a), 202 (13), 2448 – 2453. http://dx.doi.org/10.1002/pssa.200521144

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