Interfacial Modification of Amorphous Substrates for Microcrystalline Silicon Growth with in situ Hydrogen Plasma Pretreatment
Document Type
Article
Publication Info
Published in Physica Status Solidi (a), Volume 202, Issue 13, 2005, pages 2448-2453.
Rights
©Physica Status Solidi (a) 2005, Wiley-VCH Verlag.
Oark Y-B., Rhee, S-W., & Li, X. (October 2005). Interfacial Modification of Amorphous Substrates for Microcrystalline Silicon Growth with In Situ Hydrogen Plasma Pretreatment. Physica Status Solidi (a), 202 (13), 2448 – 2453. http://dx.doi.org/10.1002/pssa.200521144
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