Polycrystalline Si_1-xGe_x Thin Film Deposition by Rapid Thermal Chemical Vapor Deposition

Author(s)

Young-Bae Park
Young-Woo Choi
Xiaodong Li, University of South Carolina - ColumbiaFollow

Document Type

Article

Publication Info

Published in Journal of Materials Science: Materials in Electronics, Volume 17, Issue 1, 2006, pages 27-33.

Rights

©Journal of Materials Science: Materials in Electronics 2006, Springer.

Park, Y-B., Choi, Y-W., Li, X. (1 January 2006). Polycrystalline Si_1-xGe_x Thin Film Deposition by Rapid Thermal Chemical Vapor Deposition. Journal of Materials Science: Materials in Electronics, 17 (10), 27 – 33. http://dx.doi.org/10.1007/s10854-005-5138-3