Submicron Gate Si3N4/AlGaN/GaN-Metal-Insulator-Semiconductor Heterostructure Field-Effect Transistors

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©IEEE Electron Device Letters 2003, Institute of Electrical and Electronics Engineers (IEEE).

Adivarahan, V., Gaevski, M., Sun, W. H., Fatima, H., Koudymov, A., Saygi, S., Simin, G., Yang, J., Khan, M. A., Tarakji, A., Shur, M. S., & Gaska, R. (September 2003). Submicron Gate Si3N4/AlGaN/GaN-Metal-Insulator-Semiconductor Heterostructure Field-Effect Transistors. IEEE Electron Device Letters, 24 (9), 541-543. http://dx.doi.org/10.1109/LED.2003.816574

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