Preparation of Ti/N and Ag/TiNx Multilayers by Plasma Based Ion Implantation With Multi-Targets Unbalanced Magnetron Sputtering
Ti/N and Ag/TiNx multilayers were prepared by plasma based ion implantation (PBII) with multi-targets unbalanced magnetron sputtering and analyzed by Auger electron microscopy (AES) and X-ray photoelectron spectroscopy (XPS). Nitrogen plasma gas and Ti and Ag multi-targets were used in this study. It was found that both gases and metal elements could be implanted into the samples. Ti/N and Ag/TiNxmultilayers were successfully fabricated by multi-cycle PBII with nitrogen plasma gas and Ti and Ag unbalanced magnetron sputtering. The possibility of design and fabrication of multilayers by this technique is also discussed. This technique for the deposition of films may find more applications.
Published in Materials Letters, Volume 44, Issue 3-4, 2000, pages 170-174.
(c) Elsevier, 2000
Ma, X., Li, X., Sun, Y., Xia, L., Su, M., & Li, G. (2000). Preparation of Ti/N and Ag/TiNx Multilayers by Plasma Based Ion Implantation with Multi-Targets Unbalanced Magnetron Sputtering. Materials Letters, 44(3-4): 170-174.