Pulsed Metalorganic Chemical Vapor Deposition of Quaternary AlInGaN Layers and Multiple Quantum Wells for Ultraviolet Light Emission

Author(s)

Changqing Chen
Jinwei Yang
Mee-Yi Ryu
Jianping Zhang
Edmundas Kuokstis
Grigory Simin, University of South Carolina - ColumbiaFollow
M. Asif Khan

Document Type

Article

Publication Info

Published in Japanese Journal of Applied Physics, Volume 41, Issue 1-#4A, 2002, pages 1924-1928.

©Japanese Journal of Applied Physics 2002, Japanese Society of Applied Physics.

Chen, C., Yang, J., Ryu, M-Y., Zhang, J., Kuokstis, E., Simin, G., & Khan, M. A. (April 2002). Pulsed Metalorganic Chemical Vapor Deposition of Quaternary AlInGaN Layers and Multiple Quantum Wells for Ultraviolet Light Emission. Japanese Journal of Applied Physics, 41 (1-#4A), 1924-1928. http://dx.doi.org/10.1143/JJAP.41.1924

Rights

©Japanese Journal of Applied Physics 2002, Japanese Society of Applied Physics.

Chen, C., Yang, J., Ryu, M-Y., Zhang, J., Kuokstis, E., Simin, G., & Khan, M. A. (April 2002). Pulsed Metalorganic Chemical Vapor Deposition of Quaternary AlInGaN Layers and Multiple Quantum Wells for Ultraviolet Light Emission. Japanese Journal of Applied Physics, 41 (1-#4A), 1924-1928. http://dx.doi.org/10.1143/JJAP.41.1924