Use of Underpotential Deposition of Zinc to Mitigate Hydrogen Absorption into Monel K500

G. Zheng, University of South Carolina - Columbia
Branko N. Popov, University of South Carolina - Columbia
Ralph E. White, University of South Carolina - Columbia

© The Electrochemical Society, Inc. 1994. All rights reserved. Except as provided under U.S. copyright law, this work may not be reproduced, resold, distributed, or modified without the express permission of The Electrochemical Society (ECS). The archival version of this work was published in the Journal of the Electrochemical Society.

http://www.electrochem.org/

Publisher's link: http://dx.doi.org/10.1149/1.2054899

DOI: 10.1149/1.2054899

Abstract

Polarization experiments and a potentiostatic pulse technique have been used to show that a monolayer coverage of zinc effectively inhibits the absorption of hydrogen into Monel K500. By depositing a monolayer of zinc on Monel K500,the hydrogen evolution reaction and hydrogen ingress flux rate were reduced by 60%.