Interfacial Modification of Amorphous Substrates for Microcrystalline Silicon Growth with in situ Hydrogen Plasma Pretreatment, Young-Bae Park, Shi-Woo Rhee, Xiaodong Li
Faculty Publications

Remote Plasma Chemical Vapour Deposition of Silicon Films at Low Temperature with H₂ and He Plasma Gases, Young-Bae Park, Xiaodong Li, Shi-Woo Rhee, Dong-Wha Park
Faculty Publications

Effects of Annealing in O₂ and N₂ on the Microstructure of Metal Organic Chemical Vapor Deposition Ta₂O₅ Film and the Interfacial SiO₂ Layer, Young-Bae Park, Xiaodong Li, Gap-Jin Nam, Shi-Woo Rhee
Faculty Publications

Characterization of the Si/SiO₂ Interface Formed by Remote Plasma Enhanced Chemical Vapor Deposition from SiH₄/N₂O with or without Chlorine Addition, Young-Bae Park, Xiaodong Li, Shi-Woo Rhee
Faculty Publications

Microstructure and Deposition Rate of Aluminum Thin Films from Chemical Vapor Deposition with Dimethylethylamine alane, Byoung-Youp Kim, Xiaodong Li, Shi-Woo Rhee
Faculty Publications

Structural Characterization of Aluminum Films Deposited on Sputtered-Titanium Nitride/ Silicon Substrate by Metalorganic Chemical Vapor Deposition from Dimethylethylamine alane, Xiaodong Li, Byoung-Youp Kim, Shi-Woo Rhee
Faculty Publications

Structural Characterization of Silicon Films Deposited at Low Temperature by Remote Plasma Enhanced Chemical Vapor Deposition, Xiaodong Li, Young-Bae Park, Dong-Hwan Kim, Shi-Woo Rhee
Faculty Publications