Determination of Work Functions in the Ta_1-xAl_xN_y/HfO₂ Advanced Gate Stack using Combinatorial Methodology

Author(s)

Kao-Shuo Chang
Martin L. Green
Jason R. Hattrick-Simpers, University of South Carolina - ColumbiaFollow
Ichiro Takeuchi
J. S. Suehle
O. Celik
S. De Gendt

Document Type

Article

Publication Info

Published in IEEE Transactions on Electron Devices, Volume 55, Issue 10, 2008, pages 2641-2647.

©IEEE Transactions on Electron Devices 2008, IEEE (Institute of Electrical and Electronics Engineers).

Chang, K.-S., Green, M. L., Hattrick-Simpers, J. R., Takeuchi, I., Suehle, J. S., Celik, O., & Gendt (October 2008). Determination of Work Functions in the Ta_1-xAl_xN_y/HfO₂ Advanced Gate Stack using Combinatorial Methodology. IEEE Transactions on Electron Devices, 55 (10), 2641 – 2647. http://dx.doi.org/10.1109/TED.2008.2003091

Rights

©IEEE Transactions on Electron Devices 2008, IEEE (Institute of Electrical and Electronics Engineers).

Chang, K.-S., Green, M. L., Hattrick-Simpers, J. R., Takeuchi, I., Suehle, J. S., Celik, O., & Gendt (October 2008). Determination of Work Functions in the Ta_1-xAl_xN_y/HfO₂ Advanced Gate Stack using Combinatorial Methodology. IEEE Transactions on Electron Devices, 55 (10), 2641 – 2647. http://dx.doi.org/10.1109/TED.2008.2003091