Potential‐Selective Deposition of Copper from Chloride Solutions Containing Iron

Ralph E. White, University of South Carolina - Columbia
James A. Trainham, University of California - Berkeley
John Newman, University of California - Berkeley
Thomas W. Chapman, University of Wisconsin - Madison

© Journal of the Electrochemical Society 1997, The Electrochemical Society.

White, R., Trainham, J.A., Newman, J., & Chapman, T.W. Potential‐Selective Deposition of Copper from Chloride Solutions Containing Iron. Journal of the Electrochemical Society, 124(5): 669-676.

http://dx.doi.org/10.1149/1.2133381

Abstract